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NIR Plan Apo 50X/0.67 – Infinity Corrected Metallurgical Objective for Through-Silicon Imaging & Fiber Laser Process Monitoring

NIR Plan Apo 50X/0.67 – Infinity Corrected Metallurgical Objective for Through-Silicon Imaging & Fiber Laser Process Monitoring Featured Image
  • NIR Plan Apo 50X/0.67 – Infinity Corrected Metallurgical Objective for Through-Silicon Imaging & Fiber Laser Process Monitoring
  • NIR Plan Apo 50X/0.67 – Infinity Corrected Metallurgical Objective for Through-Silicon Imaging & Fiber Laser Process Monitoring

NIR Plan Apo 50X/0.67 – Infinity Corrected Metallurgical Objective for Through-Silicon Imaging & Fiber Laser Process Monitoring

The NIR Plan Apo 50X/0.67 is a premium infinity corrected plan apochromatic microscope objective specifically optimized for near-infrared (NIR) applications. With a numerical aperture (NA) of 0.67 and a working distance (WD) of 10 mm, it delivers exceptional resolution (0.5 µm) and excellent NIR transmission across the 380–700 nm visible range as well as the critical 1064 nm wavelength – making it ideal for silicon wafer backside inspection, through-silicon via (TSV) metrology, and real-time monitoring of fiber laser processing.

Key Specifications:

  • Magnification: 50X
  • Numerical Aperture (NA): 0.67
  • Working Distance (WD): 10 mm
  • Focal length: 4 mm
  • Resolution: 0.5 µm
  • Depth of field (±D.F): 0.75 µm
  • Maximum field of view: 0.5 mm
  • Weight: 430 g
  • Optical design: Infinity corrected, plan apochromat (APO)
  • Working wavelength: 380–700 nm & 1064 nm
  • Immersion medium: Air

Product Detail

Product Tags

Typical applications:
Semiconductor inspection – Backside wafer inspection, TSV (through-silicon via) measurement, defect review after laser dicing
Failure analysis – Non-destructive imaging through silicon substrates to inspect buried structures
Laser processing – Real-time observation of 1064 nm fiber laser ablation, drilling, or welding in materials science and manufacturing
Metallurgy & materials science – High-resolution inspection of laser heat-affected zones, recast layers, and microstructures
NIR fluorescence microscopy – For biological or materials samples requiring near-infrared excitation
Microscope Objective


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