The plan (flat field) correction ensures that the image remains sharp and in focus from center to edge – essential for capturing large samples without refocusing. The infinity correction allows easy integration of auxiliary components (beam splitters, polarizers, filters) in the parallel optical path, which is particularly useful for custom machine vision systems and multi-modal microscopy.
With an NA of 0.4, this 20X objective provides good resolution (theoretical ~0.84 µm at 550nm) and light gathering capability, suitable for most general inspection tasks. The 11.1 mm working distance offers a practical gap between the objective front lens and the specimen – safe for thick samples, probes, or illumination accessories.
Typical applications:
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